Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
- 著者名:
Plumhoff, J. ( Unaxis USA, Inc. (USA) ) Constantine, C. ( Unaxis USA, Inc. (USA) ) Shin, J. ( Unaxis USA, Inc. (USA) ) Reelfs, B. ( Unaxis USA, Inc. (USA) ) Rausa, E. ( Unaxis USA, Inc. (USA) ) Benz, J.M. ( IBM Microelectronics Div. (USA) ) Hibbs, M.S. ( IBM Microelectronics Div. (USA) ) Brunner, T.A. ( IBM Microelectronics Div. (USA) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 253
- 終了ページ:
- 263
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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