Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
- 著者名:
- Jang, I.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
- Lee, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
- Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
- Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
- Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 246
- 終了ページ:
- 252
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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3
国際会議録
Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |