Negative chemically amplified resist in making mask for a logic device with high pattern density
- 著者名:
- Nam, K.-H. ( DuPont Photomasks Korea Ltd. (South Korea) )
- Cho, H.-J.
- Jeong, S.-H.
- Ahn, C.-N.
- Kim, H.-S.
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 197
- 終了ページ:
- 204
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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