The feasibility study of thin Cr film for low process bias
- 著者名:
Seo, W.-W. ( Photronics-PKL (South Korea) ) Yoon, S.-Y. ( Photronics-PKL (South Korea) ) Park, D.-I. ( Photronics-PKL (South Korea) ) Park, E.-S. ( Photronics-PKL (South Korea) ) Kim, J.-M. ( Photronics-PKL (South Korea) ) Jeong, S.-M. ( Photronics-PKL (South Korea) ) Choi, S.-S. ( Photronics-PKL (South Korea) ) Cha, H.-S. ( S&S Tech. (South Korea) ) Nam, K.S. ( S&S Tech. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 136
- 終了ページ:
- 143
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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