Initial capability of new photomask-blank deposition tool
- 著者名:
Kriese, M.D. ( Osmic, Inc. (USA) ) Wood, J.L. ( Osmic, Inc. (USA) ) Rodriguez, J.R. ( Osmic, Inc. (USA) ) Fournier, G. ( Osmic, Inc. (USA) ) Thompson, D.L. ( Rohwedder Inc. (USA) ) Mercer, D. ( Rohwedder Inc. (USA) ) Gass, J.A. ( Rohwedder Inc. (USA) ) Mauldin, D.E. ( Rohwedder Inc. (USA) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 118
- 終了ページ:
- 126
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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