Initial capability of new photomask-blank deposition tool

Initial capability of new photomask-blank deposition tool

著者名:

Kriese, M.D. ( Osmic, Inc. (USA) )

Wood, J.L. ( Osmic, Inc. (USA) )

Rodriguez, J.R. ( Osmic, Inc. (USA) )

Fournier, G. ( Osmic, Inc. (USA) )

Thompson, D.L. ( Rohwedder Inc. (USA) )

Mercer, D. ( Rohwedder Inc. (USA) )

Gass, J.A. ( Rohwedder Inc. (USA) )

Mauldin, D.E. ( Rohwedder Inc. (USA) )

さらに 3 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5130

発行年:

2003

開始ページ:

118

終了ページ:

126

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

言語:

英語

請求記号:

P63600/5130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013118
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2003 : 10th
会議開催地:	Yokohama, Japan
会議開催年:	2003.04.16-2003.04.18

類似資料:

1 国際会議録 Initial Capability of New Photomask-Blank Deposition Tool M.D. Kriese, J.L. Wood, J.R. Rodriguez, G. Fournier, D.L. Thompson, D. Mercer, J.A. Gass, D.E. Mauldin Society of Vacuum Coaters	7 国際会議録 Current status of next-generation EUVL mask blank tool development Ma, A., Kemp, K.G., Randive, R., Weaver, A., Roberti, M., Hayes, A.V., Abraham, D.L., Mirkarimi, P.B., Spiller, E.A., … SPIE - The International Society of Optical Engineering
2 国際会議録 Initial results of new photomask-blank deposition tool Kriese, M.D., Rodriguez, J.R., Platonov, Y.Y., Wood, J.L. SPIE - The International Society of Optical Engineering	8 国際会議録 Development of a technique for rapid at-wavelength inspection of EUV mask blanks Spector,S.J., Luo,P., Novembre,A.E., Ocola,L.E., White,D.L., Tennant,D.M., O.R.Wood ? SPIE - The International Society for Optical Engineering
3 国際会議録 Control of Mo/Si multilayers for soft x-ray performance Kriese,M.D., Fournier,G., Rodriguez,J., Platonov,Y.Y. SPIE - The International Society for Optical Engineering	9 国際会議録 Demonstration of KHILS two-color IR projection capability Jones,L.E., Coker,J.S., Gorbo,D.L., Olson,E.M., Murrer,R.L.,Jr., Bergin,T.P., Goldsmith,G.C.II, Crow,D.R., Guertin,A.W., … SPIE-The International Society for Optical Engineering
4 国際会議録 Rapid at-wavelength inspection of FUV mask blanks by photoresist transfer Spector,S.J., White,D.L., Tennant,D.M., Luo,P., ll,O.R.Wood SPIE - The International Society for Optical Engineering	10 国際会議録 Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM Chen, G., Reyes, J., Wood, J.L., Kashkoush, I., Dieu, L., Novak, R. SPIE - The International Society of Optical Engineering
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6 国際会議録 Slater Transition in the Pyrochlore Cd2Os2O7 Mandrus, D., Thompson, J.R., Woods, L.M. Materials Research Society	12 国際会議録 Sol-gel fabrication of high-quality photomask substrates Ganguli, R., Meixner, D.L., Colbern, S.G., Gleason, M.S., Meyers, D.E., Chaudhuri, S.R. SPIE-The International Society for Optical Engineering

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