Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
- 著者名:
Cho, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Ahn, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, W.-I. ( Samsung Electronics Co., Ltd. (South Korea) ) Sung, M.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 107
- 終了ページ:
- 117
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |