Mask cost and cycle time reduction (Invited Paper)
- 著者名:
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd (Taiwan) ) Hung, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chin, A.S.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, S.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shin, J.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Liu, R.G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 4
- 終了ページ:
- 15
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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