Does technology acceleration equate to mask cost acceleration? (Invited Paper)

Does technology acceleration equate to mask cost acceleration? (Invited Paper)

著者名:

Trybula, W.J. ( International SEMATECH (USA) )
Grenon, B.J. ( Grenon Consulting, Inc. (USA) )

掲載資料名:

Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5043

発行年:

2003

開始ページ:

93

終了ページ:

99

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448484 [0819448486]

言語:

英語

請求記号:

P63600/5043

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013034
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Cost and performance in integrated circuit creation
回次:	2003
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.27-2003.02.28

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