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Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology

著者名:
Lee, T.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Wang, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chi, M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lu, C.Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, C.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liao, H.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yang, S.S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chang, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
さらに 4 件
掲載資料名:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5042
発行年:
2003
開始ページ:
346
終了ページ:
352
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
言語:
英語
請求記号:
P63600/5042
資料種別:
国際会議録

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