Optimizing manufacturability for the 65-nm process node
- 著者名:
- Pramanik, D. ( Synopsys, Inc. (USA) )
- Cote, M.L. ( Synopsys, Inc. (USA) )
- 掲載資料名:
- Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5042
- 発行年:
- 2003
- 開始ページ:
- 326
- 終了ページ:
- 333
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448477 [0819448478]
- 言語:
- 英語
- 請求記号:
- P63600/5042
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |