Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

著者名:

Saito, T. ( Gigaphoton Inc. (Japan) )

Suzuki, T. ( Gigaphoton Inc. (Japan) )

Yoshino, M. ( Gigaphoton Inc. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Matsunaga, T. ( Gigaphoton Inc. (Japan) )

Fujimoto, J. ( Gigaphoton Inc. (Japan) )

Kakizaki, K. ( Gigaphoton Inc. (Japan) )

Yamazaki, T. ( Gigaphoton Inc. (Japan) )

Inoue, T. ( Gigaphoton Inc. (Japan) )

Terashima, K. ( Gigaphoton Inc. (Japan) )

Enami, T. ( Gigaphoton Inc. (Japan) )

Inoue, H. ( Gigaphoton Inc. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

Tomaru, H. ( Gigaphoton Inc. (Japan) )

Mizoguchi, H. ( Gigaphoton Inc. (Japan) )

さらに 10 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Three

開始ページ:

1704

終了ページ:

1711

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013031
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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