Wavefront aberration measurement in 157-nm high numerical aperture lens

Wavefront aberration measurement in 157-nm high numerical aperture lens

著者名:

Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kanda, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Cashmore, J.S. ( Exitech Ltd. (United Kingdom) )

Gower, M.C. ( Exitech Ltd. (United Kingdom) )

さらに 2 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Three

開始ページ:

1408

終了ページ:

1419

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013031
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering	7 国際会議録 High-resolution 157-nm laser micromachining of polymers Gruenewald,P., Cashmore,J.S., Fieret,J., Gower,M.C. SPIE-The International Society for Optical Engineering
2 国際会議録 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node Suganaga, T., Lee, J.-W., Kurose, E., Ishimaru, T., Furukawa, T., Itani, T., Fujii, K., Cashmore, J.S., Gower, M. SPIE - The International Society of Optical Engineering	8 国際会議録 157-nm lithography for 65-nm node SRAM-gate Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., … SPIE-The International Society for Optical Engineering
3 国際会議録 Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography Morikawa, Y., Kokubo, H., Noguchi, K., Sasaki, S., Mohri, H., Hoga, M., Kanda, N., Irie, S., Watanabe, K., Suganaga, T., … SPIE-The International Society for Optical Engineering
4 国際会議録 Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography Watanabe, K., Yamabe, O., Kanda, N., Kim, J., Uchida, N., Irie, S., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	10 国際会議録 High-resolution 157-nm imaging for lithography and micromachining applications Gower,M.C., Cashmore,J.S., Whitfield,M.D., Grunewald,P. SPIE-The International Society for Optical Engineering
5 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 193-nm excimer laser microstepper system (Invited Paper) Rizvi,N.H., Cashmore,J.S., Solomon,C.M., Rumsby,P.T., Gower,M.C. SPIE-The International Society for Optical Engineering
6 国際会議録 157-nm chromeless phase lithography with extremely high numerical aperture Watanabe, K., Hagiwara, T., Matsuura, S., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	12 国際会議録 Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering

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