New process models for OPC at sub-90-nm nodes

New process models for OPC at sub-90-nm nodes

著者名:

Granik, Y. ( Mentor Graphics Corp. (USA) )
Cobb, N.B. ( Mentor Graphics Corp. (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Two

開始ページ:

1166

終了ページ:

1175

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013030
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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1 国際会議録 Universal process modeling with VTRE for OPC Granik, Y., Cobb, N., Do, T. SPIE-The International Society for Optical Engineering	7 国際会議録 Application of CMO resist model to OPC and verification [6154-132] Granik, Y., Cobb, N., Medvedev, D. SPIE - The International Society of Optical Engineering
2 国際会議録 Model-based OPC using the MEEF matrix Cobb, N,B,, Granik, Y. SPIE-The International Society for Optical Engineering	8 国際会議録 Enhanced model-based OPC for 65 nm and below Word V, J., Cobb, N. B. SPIE - The International Society of Optical Engineering
3 国際会議録 Toward standard process models for OPC Y. Granik, D. Medvedev, N. Cobb SPIE - The International Society of Optical Engineering	9 国際会議録 Model-based OPC considering process window aspects: a study Schulze, S.F., Park, O., Zimmermann, R., Chen, M.-J., LaCour, P., Sahouria, E.Y., Granik, Y., Cobb, N. SPIE-The International Society for Optical Engineering
4 国際会議録 OPC methods to improve image slope and process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering	10 国際会議録 Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering
5 国際会議録 New concepts in OPC Cobb, N., Granik, Y. SPIE - The International Society of Optical Engineering	11 国際会議録 Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering
6 国際会議録 Using OPC to optimize for image slope and improve process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering	12 国際会議録 Calibration of compact OPC models using SEM contours [5992-68] Granik, Y. SPIE - The International Society of Optical Engineering

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