Evaluation of SCAA mask technology as a pathway to the 65-nm node

Evaluation of SCAA mask technology as a pathway to the 65-nm node

著者名:

Beach, J.V. ( International SEMATECH (USA) )
Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )
Maslow, M.J. ( Petersen Advanced Lithography, Inc. (USA) )
Gerold, D.J. ( Petersen Advanced Lithography, Inc. (USA) )
McCafferty, D.C. ( ASML (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Two

開始ページ:

1103

終了ページ:

1114

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013030
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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