Contact-hole MEEF comparison between ALTA and 50-KeV written masks
- 著者名:
- Sturtevant, J.L. ( Integrated Device Technology, Inc. (USA) )
- Opitz, J. ( Integrated Device Technology, Inc. (USA) )
- Word, J.C. ( Integrated Device Technology, Inc. (USA) )
- 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 1055
- 終了ページ:
- 1061
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
国際会議録
Assist feature OPC implementation for the 130-nm technology node with KrF and no forbidden pitches
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |