Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
- 著者名:
Cotte, E.P. ( Univ. of Wisconsin/Madison (USA) ) Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) ) Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) ) Tanzil, D. ( Intel Corp. (USA) ) Eschbach, F.O. ( Intel Corp. (USA) ) Korobko, Y.O. ( Intel Corp. (USA) ) Fujita, M. ( Mitsui Chemicals, Inc. (Japan) ) Nakagawa, H. ( Mitsui Chemicals, Inc. (Japan) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 1044
- 終了ページ:
- 1054
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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