Theoretical corner rounding analysis and mask writer simulation
- 著者名:
- Jones, R.L. ( KLA-Tencor Corp. (USA) )
- Byers, J.D. ( KLA-Tencor Corp. (USA) )
- 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 1035
- 終了ページ:
- 1043
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Top-down versus cross-sectional SEM metrology and its impact on lithography simulation calibration
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |