Investigation of BARC-resist interfacial interactions

Investigation of BARC-resist interfacial interactions

著者名:

Devadoss, C. ( Brewer Science, Inc. (USA) )

Wang, Y. ( Brewer Science, Inc. (USA) )

Puligadda, R. ( Brewer Science, Inc. (USA) )

Lenhart, J.L. ( Sandia National Labs. (USA) )

Jablonski, E.L. ( National Institute of Standards and Technology (USA) )

Fischer, D.A. ( National Institute of Standards and Technology (USA) )

Sambasivan, S. ( National Institute of Standards and Technology (USA) )

Lin, E.K. ( National Institute of Standards and Technology (USA) )

Wu, W.-L. ( National Institute of Standards and Technology (USA) )

さらに 4 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Two

開始ページ:

912

終了ページ:

922

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013030
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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2 国際会議録 Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues Jablonski, E.L., Prabhu, V.M., Sambasivan, S., Fischer, D.A., Lin, E.K., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering	8 国際会議録 Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE - The International Society of Optical Engineering
3 国際会議録 Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists Prabhu, V.M., Wang, M.X., Jablonski, E.L., Vogt, B.D., Lin, E.K., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering	9 国際会議録 Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE-The International Society for Optical Engineering
4 国際会議録 Chain conformation in ultrathin polymer films Jones, R.L., Soles, C.L., Starr, F.W., Lin, E.K., Lenhart, J.L., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	10 国際会議録 Characterization of thin and ultrathin polymer and resist films Goldfarb,D.L., Lin,Q., Angelopoulos,M., Soles,C.L., Lin,E.K., Wu,W.-L. SPIE-The International Society for Optical Engineering
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