Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

著者名:

Bloomstein, T.M. ( MIT Lincoln Lab. (USA) )
Hardy, D.E. ( MIT Lincoln Lab. (USA) )
Gomez, L. ( MIT Lincoln Lab. (USA) )
Rothschild, M. ( MIT Lincoln Lab. (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Two

開始ページ:

742

終了ページ:

752

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013030
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 Optical materials and coatings at 157 nm Bloomstein,T.M., Liberman,V., Rothschild,M., Hardy,D.E., Goodman,R.B. SPIE - The International Society for Optical Engineering	7 国際会議録 UV cleaning of contaminated 157-nm reticles Bloomstein,T.M., Liberman,V., Rothschild,M., Efremow Jr.,N.N., Hardy,D.E., Palmacci,S.T. SPIE-The International Society for Optical Engineering
2 国際会議録 Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities Bloomstein, T.M., Liberman, V., Rothschild, M., Palmacci, S.T., Hardy, D.E., Sedlacek, J.H.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Interference lithography at 157 nm Switkes,M., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering
3 国際会議録 Determination of optical properties of thin films and surfaces in 157-nm lithography Liberman,V., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering	9 国際会議録 Controlled contamination of optics under 157-nm laser irradiation Bloomstein,T.M., Liberman,V., Palmacci,S.T., Rothschild,M. SPIE-The International Society for Optical Engineering
4 国際会議録 Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists Bloomstein, T.M., Sedlacek, J.H.C., Palmacci, S.T., Hardy, D.E., Liberman, V., Rothschild, M. SPIE-The International Society for Optical Engineering	10 国際会議録 Outlook for 157-nm resist design Kunz, R. R., Bloomstein, T. M., Hardy, D. E., Goodman, R. B., Downs, D. K., Curtin, J. E. SPIE - The International Society of Optical Engineering
5 国際会議録 Laser cleaning of optical elements in 157-nm lithography Bloomstein,T.M., Rothschild,M., Liberman,V., Hardy,D.E., Efremow,N.N.,Jr., Palmacci,S.T. SPIE - The International Society for Optical Engineering	11 国際会議録 Photoresist outgassing at 157-nm exposure Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K. SPIE-The International Society for Optical Engineering
6 国際会議録 Photo-induced changes in 157-nm optical coatings Liberman, V., Bloomstein, T.M., Rothschild, M., Palmacci, S.T., Sedlacek, J.H.C., Grenville, A. SPIE - The International Society of Optical Engineering	12 国際会議録 Measurement of total integrated scatter of optical coatings for 157-nm lithography Saito,T., Saito,J., Nakamura,E., Kudo,T., Kagaya,M., Takahashi,T. SPIE-The International Society for Optical Engineering

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