Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

著者名:

Fontaine, B.M.L. ( Advanced Micro Devices, Inc. (USA) )

Hauschild, J. ( ASML (Netherlands) )

Dusa, M.V. ( ASML (Netherlands) )

Acheta, A. ( Advanced Micro Devices, Inc. (USA) )

Apelgren, E.M. ( Advanced Micro Devices, Inc. (USA) )

Boonman, M. ( ASML (Netherlands) )

Krist, J. ( ASML (Netherlands) )

Khathuria, A. ( Advanced Micro Devices, Inc. (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Fumar-Pici, A. ( ASML (Netherlands) )

Pieters, M. ( ASML (Netherlands) )

さらに 6 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

570

終了ページ:

581

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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1 国際会議録 Analysis of focus errors in lithography using phase-shift monitors La Fontaine, B., Dusa, M.V., Krist, J., Acheta, A., Kye, J., Levinson, H.J., Luijten, C., Sager, C.B., Thomas, J., van … SPIE-The International Society for Optical Engineering	7 国際会議録 Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Deng, Y., Fontaine, B.M.L., Levinson, H.J., Neureuther, A.R. SPIE-The International Society for Optical Engineering
2 国際会議録 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography C. S. Saravanan, S. Nirmalgandhi, O. Kritsun, A. Acheta, R. Sandberg, B. L. Fontaine, H. J. Levinson, K. Lensing, M. … SPIE - The International Society of Optical Engineering	8 国際会議録 Linewidth asymmetry study to predict aberration in lithographic lenses Kye,J., Dusa,M.V., Levinson,H.J. SPIE-The International Society for Optical Engineering
3 国際会議録 Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry O. Kritsun, B. L. Fontaine, R. Sandberg, A. Acheta, H. J. Levinson, K. Lensing, M. Dusa, J. Hauschild, A. Pici, C. … SPIE - The International Society of Optical Engineering	9 国際会議録 Advanced process control applied to 90-nm lithography and etch Kota, G.P., Luque, J., Dusa, M.V., Hunter, A. SPIE-The International Society for Optical Engineering
4 国際会議録 Flare and its impact on low-k1 KrF and ArF lithography La Fontaine, B., Dusa, M.V., Acheta, A., Chen, C., Bourov, A., Levinson, H.J., Litt, L.C., Mulder, M., Seltman, R., van … SPIE-The International Society for Optical Engineering	10 国際会議録 Spherical aberration measurement and in-situ correction Acheta, A., Kye, J., Levinson, H.J. SPIE-The International Society for Optical Engineering
5 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering	11 国際会議録 Evaluation and characterization of flare in ArF lithography Litt, L.C., Bourov, A., La Fontaine, B., Apelgren, E.M. SPIE-The International Society for Optical Engineering
6 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering	12 国際会議録 Lithography: a look at what is ahead Levinson,H.J. SPIE-The International Society for Optical Engineering

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