Application of CPL reticle technology for the 65- and 50-nm node
- 著者名:
Conley, W. ( Motorola, Inc. (USA) ) Broeke, D.J.V.D. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Wu, W. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Lucas, K. ( Motorola, Inc. (USA) ) Nelson-Thomas, C.M. ( Motorola, Inc. (USA) ) Roman, B.J. ( Motorola, Inc. (USA) ) Chen, F. ( ASML (USA) ) Wampler, K.E. ( ASML (USA) ) Laidig, T.L. ( ASML (USA) ) Hsu, S.D. ( ASML (USA) ) Schaefer, E. ( ASML (USA) ) Cassel, S. ( ASML (USA) ) Yu, L. ( ASML (USA) ) Kasprowicz, B.S. ( Photronics Inc. (USA) ) Progler, C.J. ( Photronics Inc. (USA) ) Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) ) Gerold, D.J. ( Petersen Advanced Lithography, Inc. (USA) ) Maslow, M.J. ( Petersen Advanced Lithography, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 392
- 終了ページ:
- 398
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society of Optical Engineering |