Application of in-situ aberration measurements to pattern-specific imaging optimization

Application of in-situ aberration measurements to pattern-specific imaging optimization

著者名:

Slonaker, S.D. ( Nikon Precision Inc. (USA) )
Chung, R.J. ( Litel Instruments (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

371

終了ページ:

382

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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