The Impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process
- 著者名:
- Cheng, M. ( Texas A&M Univ. (USA) )
- Ho, B.C.P. ( Tokyo Electron Texas LLC (USA) )
- Guenther, D.E. ( International SEMATECH (USA) )
- 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 313
- 終了ページ:
- 326
- 総ページ数:
- 14
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes
SPIE-The International Society for Optical Engineering |
7
国際会議録
Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
国際会議録
Alternating aperture phase shift mask process using e-beam lithography for the second level
SPIE - The International Society of Optical Engineering |