Alternating phase-shift masks for contact patterning

Alternating phase-shift masks for contact patterning

著者名:

Schenker, R.E. ( Intel Corp. (USA) )
Allen, G.A. ( Intel Corp. (USA) )
Tejnil, E. ( Intel Corp. (USA) )
Ogadhoh, S. ( Intel Corp. (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

294

終了ページ:

302

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 Comparison of single- and dual-exposure phase-shift mask approaches for polygate patterning Schenker,R.E. SPIE - The International Society for Optical Engineering	7 国際会議録 Application of alternating phase-shifting masks to 200-nm contact holes Lim,S.-C., Woo,S.-G., Park,C.-G., Koh,Y.-B. SPIE-The International Society for Optical Engineering
2 国際会議録 Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks Tenjil,E., Stivers,A.R., Schenker,R.E., Zurbrick,L.S. SPIE - The International Society for Optical Engineering	8 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
3 国際会議録 Effects of phase-shift masks on across-field linewidth control Schenker,R.E. SPIE - The International Society for Optical Engineering	9 国際会議録 Alternated phase shift mask for 45nm node contact holes patterning [6154-162] Cantu, P., petti, G. Co, Catarisano, C., D’Angelo, F., Vaccaro, A. SPIE - The International Society of Optical Engineering
4 国際会議録 Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation Pforr, R., Dettmann, W., Eisenhut, M., Hennig, M., Hofmann, D., Thiele, J., Thielscher, G. SPIE - The International Society of Optical Engineering	10 国際会議録 Pattern dependence of mask topography effect in alternating phase-shifting masks Yasuzato, T., Ishida, S., Tanabe, H. SPIE - The International Society of Optical Engineering
5 国際会議録 Lithography strategy for 65-nm node (Invited Paper) Borodovsky, Y.A., Schenker, R.E., Allen, G.A., Tejnil, E., Hwang, D.H., Lo, F.-C., Singh, V.K., Gleason, R.E., … SPIE-The International Society for Optical Engineering	11 国際会議録 Pattern-dependent correction of mask topography effects for alternating phase-shifting masks R.A. Ferguson, A.K. Wong, T.A. Brunner, L.W. Liebmann Society of Photo-optical Instrumentation Engineers
6 国際会議録 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B. SPIE-The International Society for Optical Engineering	12 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering

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