Characterizing illumination angular uniformity with phase-shifting masks

Characterizing illumination angular uniformity with phase-shifting masks

著者名:

McIntyre, G. ( Univ. of California/Berkeley (USA) )
Neureuther, A.R. ( Univ. of California/Berkeley (USA) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

162

終了ページ:

170

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks McIntyre, G.R., Neureuther, A.R. SPIE - The International Society of Optical Engineering	7 国際会議録 Illumination, mask, and tool effects on pattern and probe-based aberration monitors Robins, G.C., Neureuther, A.R. SPIE-The International Society for Optical Engineering
2 国際会議録 Phase shifting mask as a precision instrument for characterizing image-forming optical systems [5878-08] Mcintyre, G., Robbins, G., Neureuther, A. SPIE - The International Society of Optical Engineering	8 国際会議録 Aberrations are a big part of OPC for phase shifting masks Gennari,F.E., Neureuther,A.R. SPIE-The International Society for Optical Engineering
3 国際会議録 Interferometric-probe monitors for self-diagnostics of phase-shifting mask performance McIntyre, G.R., Neureuther, A. SPIE - The International Society of Optical Engineering	9 国際会議録 Experimental verification of PSM polarimetry: monitoring polarization at 193-nrn high-NA with phase-shift masks [6154-13] Mcintyre, G., Neureuther, A., Slonaker, S., Vellanki, V., Reynolds, P. SPIE - The International Society of Optical Engineering
4 国際会議録 Characterizing the demons in high-NA phase-shifting masks Robins, G. C., Neureuther, A. R. SPIE - The International Society of Optical Engineering	10 国際会議録 Focus shift and process latitude of contact holes on attenuated phase-shifting masks A.K. Wong, R.A. Ferguson, R.M. Martino, A.R. Neureuther Society of Photo-optical Instrumentation Engineers
5 国際会議録 EUV phase-shifting masks and aberration monitors Deng, Y., Neureuther, A.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook G. McIntyre, R. Tu Society of Photo-optical Instrumentation Engineers
6 国際会議録 Assessment of synchronous filtering as an alternative to phase-shifting masks at kl=0.4 Neureuther,A.R., Li,M. SPIE - The International Society for Optical Engineering	12 国際会議録 The effects of the photomask on multiphase shift test monitors [6349-135] Mcintyre, G., Neureuther, A. SPIE - The International Society of Optical Engineering

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