Blank Cover Image

Optimizing and enhancing optical systems to meet the low k1 challenge

著者名:
Flagello, D.G. ( ASML (USA) )
Socha, R.J. ( ASML (USA) )
Shi, X. ( ASML (USA) )
Schoot, J.B. ( ASML (Netherlands) )
Baselmans, J. ( ASML (Netherlands) )
Kerkhof, M.A. ( ASML (Netherlands) )
Boeij, W. ( ASML (Netherlands) )
Engelen, A. ( ASML (Netherlands) )
Carpaij, R. ( ASML (Netherlands) )
Noordman, O. ( ASML (Netherlands) )
Moers, M.H.P. ( ASML (Netherlands) )
Mulder, M. ( ASML (Netherlands) )
Finders, J. ( ASML (Netherlands) )
Greevenbroek, H. ( ASML (Netherlands) )
Schriever, M. ( Carl Zeiss SMT AG (Germany) )
Maul, M. ( Carl Zeiss SMT AG (Germany) )
Haidner, H. ( Carl Zeiss SMT AG (Germany) )
Goeppert, M. ( Carl Zeiss SMT AG (Germany) )
Wegmann, U. ( Carl Zeiss SMT AG (Germany) )
Graeupner, P. ( Carl Zeiss SMT AG (Germany) )
さらに 15 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part One
開始ページ:
139
終了ページ:
150
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

類似資料:

1 国際会議録 Can DUV take us below 100 nm?

Finders,J., Jorritsma,L., Eurlings,M., Moerman,R., Greevenbroek,H.van, Schoot,J.B.van, Flagello,D.G., Socha,R.J., …

SPIE-The International Society for Optical Engineering
7 国際会議録 Etch, reticle, and track CD fingerprint corrections with local dose compensation

van der Laan, H., Carpaij, R., Krist, J., Noordman, O., van Dommelen, Y., van Schoot, J., Blok, F., van Os, C., …

SPIE - The International Society of Optical Engineering
2 国際会議録 Full optical column characterization of DUV lithographic projection tools

van de Kerkhof, M.A., de Boeij, W., Kok, H., Silova, M., Baselmans, J., Hemerik, M.

SPIE - The International Society of Optical Engineering
8 国際会議録 Extending optical lithography with immersion

Streefkerk, B., Baselmans, J., Gehoel-van Ansem, W., Mulkens, J., Hoogendam, C., Hoogendorp, M., Flagello, D.G., Sewell, …

SPIE - The International Society of Optical Engineering
3 国際会議録 Solutions for printing sub-100-nm contacts with ArF

Graeupner, P., Goehnermeier, A., Lowisch, M., Garreis, R.B., Flagello,D.G., Hansen, S.G., Socha, R.J., Koehler, C.

SPIE-The International Society for Optical Engineering
9 国際会議録 Understanding systematic and random CD variations using predictive modeling techniques

Flagello,D.G., Laan,H.van der, Schoot,J.van, Bouchoms,I., Geh,B.

SPIE - The International Society for Optical Engineering
4 国際会議録 New paradigm in lens metrology for lithographic scanner: evaluation and exploration

Lai, K., Gallatin, G.M., van de Kerkhof, M.A., Boeij, Wim de, Kok, H., Schriever, M., Morillo, J.D., Fair, R.H., …

SPIE - The International Society of Optical Engineering
10 国際会議録 Fluorescence scanning near-field optical microscopy in reflection

A. Jalocha, M.H.P. Moers, N.F. van Hulst

Society of Photo-optical Instrumentation Engineers
5 国際会議録 (633b) Activity Based Adsorption Isotherms for Adsorption From Mixed Solvents

Christine Wegmann, Piet J. A. M. Kerkhof

American Institute of Chemical Engineers
11 国際会議録 Toward a comprehensive control of full-field image quality in optical photolithography

Flagello,D.G., Klerk,J.de, Davies,G., Rogoff,R., Geh,B., Arnz,M., Wegmann,U., Kraemer,M.

SPIE-The International Society for Optical Engineering
6 国際会議録 Imaging performance optimization for hyper-NA scanner systems in high volume production

M. van de Kerkhof, E. van Setten, A. Engelen, V. Plachecki, H. Liu

Society of Photo-optical Instrumentation Engineers
12 国際会議録 The contact hole solutions for future logic technology nodes

A. Chen, S. Hansen, M. Moers, J. Shieh, A. Engelen

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12