Novel development method to improve critical dimensional control
- 著者名:
- Nishiya, A. ( Tokyo Electron Kyushu Ltd. (Japan) )
- Sakamoto, K. ( Tokyo Electron Kyushu Ltd. (Japan) )
- 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1343
- 終了ページ:
- 1352
- 総ページ数:
- 10
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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5
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Novel polymeric antireflective coating(PARC)for better uniformity control of critical dimension
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