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Critical dimension (CD) control in 157-nm lithography

著者名:
Hori, S. ( Tokyo Electron Kyushu Ltd. (Japan) )
Yoshihara, K. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kyoda, H. ( Tokyo Electron Kyushu Ltd. (Japan) )
Matsui, H. ( Tokyo Electron Ltd. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
2
パート:
Poster Session
開始ページ:
1333
終了ページ:
1342
総ページ数:
10
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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