Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes
- 著者名:
Ho, B.C.P. ( Tokyo Electron Texas, LLC (USA) ) Guenther, D. ( International SEMATECH (USA) ) Cheng, M. ( Texas A&M Univ. (USA) ) Sotoodeh, K. ( International SEMATECH (USA) ) Rudack, A. ( International SEMATECH (USA) ) Yamaguchi, R. ( Tokyo Electron Texas, LLC (USA) ) Brown, B. ( Tokyo Electron Texas, LLC (USA) ) Ickes, M. ( Tokyo Electron Texas, LLC (USA) ) Nafus, K. ( Tokyo Electron Texas, LLC (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1229
- 終了ページ:
- 1241
- 総ページ数:
- 13
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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