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Novel silicon-containing polymers as photoresist materials for EUV lithography

著者名:
Kwark, Y.-J. ( Cornell Univ. (USA) )
Bravo-Vasquez, J.-P. ( Cornell Univ. (USA) )
Ober, C.K. ( Cornell Univ. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Deng, H. ( Intel Corp. (USA) )
Meagley, R.P. ( Intel Corp. (USA) )
さらに 1 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
2
パート:
Poster Session
開始ページ:
1204
終了ページ:
1211
総ページ数:
8
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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