Synthesis and evaluation of novel organoelement resists for EUV lithography

Synthesis and evaluation of novel organoelement resists for EUV lithography

著者名:

Dai, J. ( Cornell Univ. (USA) )

Ober, C.K. ( Cornell Univ. (USA) )

Kim, S.-O. ( Univ. of Wisconsin/Madison (USA) )

Nealey, P.F. ( Univ. of Wisconsin/Madison (USA) )

Golovkina, V. ( Univ. of Wisconsin/Madison (USA) )

Shin, J. ( Univ. of Wisconsin/Madison (USA) )

Wang, L. ( Univ. of Wisconsin/Madison (USA) )

Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )

さらに 3 件

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

2

パート:

Poster Session

開始ページ:

1164

終了ページ:

1172

総ページ数:

9

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Poster Session ; 5039-134

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1 国際会議録 Organoelement resists for EUV lithography Dai, J., Ober, C.K., Wang, L., Cerrina, F., Nealey, P.F. SPIE-The International Society for Optical Engineering	7 国際会議録 Silicon backbone polymers as EUV resists Bravo-Vasquez, J.P., Kwark, Y.-J., Ober, C.K., Cao, H.B., Deng, H., Meagley, R.P. SPIE - The International Society of Optical Engineering
2 国際会議録 Novel resists with nontraditional compositions for EUV lithography Dai, J., Ober, C.K. SPIE - The International Society of Optical Engineering	8 国際会議録 EUV radiation damage test on EUVL mask absorber materials Lu, B., Wasson, J.R., Han, S.-I., Mangat, P., Golovkina, V., Cerrina, F. SPIE - The International Society of Optical Engineering
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