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Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists

著者名:
Kang, J.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Oh, S.-K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Son, E.-K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J.-W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, Y.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Choi, Y.-J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D.-B. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
2
パート:
Poster Session
開始ページ:
1052
終了ページ:
1062
総ページ数:
11
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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