PEB sensitivity studies of ArF resist
- 著者名:
Lee, S.H. ( Clariant Corp. (USA) ) Kim, W.-K. ( Clariant Corp. (USA) ) Rahman, D.M. ( Clariant Corp. (USA) ) Kudo, T. ( Clariant Corp. (USA) ) Timko, A. ( Clariant Corp. (USA) ) Anyadiegwu, C. ( Clariant Corp. (USA) ) McKenzie, D.S. ( Clariant Corp. (USA) ) Kanda, T. ( Clariant Japan K.K. (Japan) ) Dammel, R.R. ( Clariant Corp. (USA) ) Padmanaban, M. ( Clariant Corp. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 798
- 終了ページ:
- 806
- 総ページ数:
- 9
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |