Effects of alkali treatment on ArF resist process
- 著者名:
- Kim, J.-S. ( Hynix Semiconductor, Inc. (South Korea) )
- Jung, J.-C. ( Hynix Semiconductor, Inc. (South Korea) )
- Kong, K.-K. ( Hynix Semiconductor, Inc. (South Korea) )
- Kim, H.-R. ( Hynix Semiconductor, Inc. (South Korea) )
- Kim, H.-S. ( Hynix Semiconductor, Inc. (South Korea) )
- 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 761
- 終了ページ:
- 769
- 総ページ数:
- 9
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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5
国際会議録
Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
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SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
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