Baking study of fluorinated 157-nm resist
- 著者名:
Houlihan, F.M. ( Clariant Corp. (USA) ) Sakamuri, R. ( Clariant Corp. (USA) ) Romano, A.R. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Conley, W. ( International SEMATECH (USA) ) Rich, G.K. ( International SEMATECH (USA) ) Miller, D. ( International SEMATECH (USA) ) Rhodes, L.F. ( Promerus LLC (USA) ) McDaniels, J.M. ( Promerus LLC (USA) ) Chang, C. ( Promerus LLC (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Poster Session
- 開始ページ:
- 641
- 終了ページ:
- 649
- 総ページ数:
- 9
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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