Negative photoresist for 157-nm microlithography: a progress report
- 著者名:
Conley, W. ( International SEMATECH (USA) ) Trinque, B.C. ( Univ. of Texas at Austin (USA) ) Miller, D. ( International SEMATECH (USA) ) Caporale, S. ( Univ. of Texas at Austin (USA) ) Osborn, B.P. ( Univ. of Texas at Austin (USA) ) Kumamoto, S. ( Univ. of Texas at Austin (USA) ) Pinnow, M.J. ( Univ. of Texas at Austin (USA) ) Callahan, R. ( Univ. of Texas at Austin (USA) ) Chambers, C.R. ( Univ. of Texas at Austin (USA) ) Lee, G.S. ( International SEMATECH (USA) ) Zimmerman, P. ( International SEMATECH (USA) ) Willson, C.G. ( Univ. of Texas at Austin (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Poster Session
- 開始ページ:
- 622
- 終了ページ:
- 626
- 総ページ数:
- 5
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |