Performances of resists for 157-nm lithography based on monocyclic fluoropolymers
- 著者名:
Ishikawa, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kawaguchi, Y. ( Asahi Glass Co., Ltd. (Japan) ) Yokokoji, O. ( Asahi Glass Co., Ltd. (Japan) ) Kodama, S.-. ( Asahi Glass Co., Ltd. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Poster Session
- 開始ページ:
- 580
- 終了ページ:
- 588
- 総ページ数:
- 9
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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11
国際会議録
The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
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