Surface and line-edge roughness in acid-breakable resin-based positive resist

Surface and line-edge roughness in acid-breakable resin-based positive resist

著者名:

Sakamizu, T. ( Hitachi, Ltd. (Japan) )
Shiraishi, H. ( Hitachi, Ltd. (Japan) )

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

1

パート:

Session 11

開始ページ:

492

終了ページ:

501

総ページ数:

10

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Session 11.Emerging Resist Technology: Joint Session ; 5039-53

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