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Controlling line-edge rougness to within reasonable limits

著者名:
Cobb, J.L. ( Motorola Digital DNA Labs. (USA) )
Rauf, S. ( Motorola Digital DNA Labs. (USA) )
Thean, A. ( Motorola Digital DNA Labs. (USA) )
Dakshina-Murthy, S. ( Advanced Micro Devices, Inc. (USA) )
Stephens, T. ( Motorola Digital DNA Labs. (USA) )
Parker, C. ( Motorola Digital DNA Labs. (USA) )
Peters, R.D. ( Motorola Digital DNA Labs. (USA) )
Rao, V. ( Motorola Digital DNA Labs. (USA) )
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
1
パート:
Session 9
開始ページ:
376
終了ページ:
383
総ページ数:
8
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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