Using the critical ionization model for resist development to estimate contrast curves and roughening

Using the critical ionization model for resist development to estimate contrast curves and roughening

著者名:

Houle, F.A. ( IBM Almaden Research Ctr. (USA) )
Hinsberg, W.D. ( IBM Almaden Research Ctr. (USA) )
Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

1

パート:

Session 8

開始ページ:

334

終了ページ:

342

総ページ数:

9

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Session 8. Resist Fundamentals ; 5039-37

類似資料:

1 国際会議録 Real-time analysis of volatiles formed during processing of a chemically amplified resist Houle,F.A., Poliskie,G.M., Hinsberg,W.D., Pearson,D., Sanchez,M.I., Ito,H., Hoffnagle,J.A. SPIE - The International Society for Optical Engineering	7 国際会議録 High-NA lithographic imagery at Brewster's angle Brunner, T.A., Seong, N., Hinsberg, W.D., Hoffnagle, J.A., Houle, F.A., Sanchez, M.I. SPIE-The International Society for Optical Engineering
2 国際会議録 High numerical aperture: imaging implications for chemically amplified photoresists Sanchez, M.I., Houle, F.A., Hoffnagle, J.A., Brunner, T.A., Hinsberg, W.D. SPIE-The International Society for Optical Engineering	8 国際会議録 Aerial image contrast using interferometric lithography: effect on line-edge roughness Sanchez, M. I., Hinsberg, W. D., Houle, F. A., Hoffnagle, J. A., Ito, H., Nguyen, C. SPIE - The International Society of Optical Engineering
3 国際会議録 Characterization of photoresist spatial resolution by interferometric lithography Hoffnagle, J.A., Hinsberg, W.D., Houle, F.A., Sanchez, M.I. SPIE-The International Society for Optical Engineering	9 国際会議録 Liquid immersion lithography: evaluation of resist issues Hinsberg, W., Wallraff, G.M., Larson, C.E., Davis, B.W., Deline, V., Raoux, S., Miller, D., Houle, F.A., Hoffnagle, J., … SPIE - The International Society of Optical Engineering
4 国際会議録 Effect of resist components on image spreading during postexposure bake of chemically amplified resists Hinsberg,W.D., Houle,F.A., Sanchez,M.I., Morrison,M.E., Wallraff,G.M., Larson,C.E., Hoffnagle,J.A., Brock,P.J., … SPIE - The International Society for Optical Engineering	10 国際会議録 EUV photoresist performance results from the VNL and the EUV LLC Cobb, J.L., Dentinger, P.M., Hunter, L.L., O'Connell, D.J., Gallatin, G.M., Hinsberg, W.D., Houle, F.A., Sanchez, M.I., … SPIE-The International Society for Optical Engineering
5 国際会議録 Extendibility of chemically amplified resists: another brick wall? (Invited Paper) Hinsberg, W.D., Houle, F.A., Sanchez, M.I., Hoffnagle, J.A., Wallraff, G.M., Medeiros, D.R., Gallatin, G.M., Cobb, J.L. SPIE-The International Society for Optical Engineering	11 国際会議録 Experimental method for quantifying acid diffusion in chemically amplified resists Wallraff, G. M., Hinsberg, W. D., Houle, F. A., Morrison, M. D., Larson, C. E., Sanchez, M, I., Hoffnagle, J. A., Brock, … SPIE - The International Society of Optical Engineering
6 国際会議録 Kinetics of chemically amplified resists G.M. Wallraff, W.D. Hinsberg, F.A. Houle, J. Opitz, D. Hopper Society of Photo-optical Instrumentation Engineers	12 国際会議録 Reactivity and kinetic parameters for UVIIHS Wallraff,G.M., Opitz,J., Hinsberg,W.D., Houle,F.A., Thackeray,J.W., Fedynyshyn,T.H., Kang,D., Rajaratnam,M.M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12