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High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities

著者名:
Khojasteh, M. ( IBM Microelectronics Div. (USA) )
Chen, K.R. ( IBM Microelectronics Div. (USA) )
Kwong, R.W. ( IBM Microelectronics Div. (USA) )
Lawson, M.C. ( IBM Microelectronics Div. (USA) )
Varanasi, P.R. ( IBM Microelectronics Div. (USA) )
Patel, K.S. ( IBM Microelectronics Div. (USA) )
Kobayashi, E. ( JSR Microelectronics (Japan) )
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
1
パート:
Session 5
開始ページ:
187
終了ページ:
194
総ページ数:
8
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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