Rational design in cyclic olefin resists for sub-100-nm lithography
- 著者名:
Li, W. ( IBM Microelectronics Div. (USA) ) Varanasi, P.R. ( IBM Microelectronics Div. (USA) ) Lawson, M.C. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Chen, K.-J. ( IBM Microelectronics Div. (USA) ) Ito, H. ( IBM Almaden Research Ctr. (USA) ) Truong, H.D. ( IBM Almaden Research Ctr. (USA) ) Allen, R.D. ( IBM Almaden Research Ctr. (USA) ) Yamamoto, M. ( JSR Corp. (Japan) ) Kobayashi, E. ( JSR Corp. (Japan) ) Slezak, M. ( JSR Micro, Inc. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Session 2
- 開始ページ:
- 61
- 終了ページ:
- 69
- 総ページ数:
- 9
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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