Blank Cover Image

Line-edge roughness reduction and CD slimming using hardback processing

著者名:
Peters, R.D. ( Motorola, Inc. (USA) )
Lucas, K. ( Motorola, Inc. (USA) )
Cobb, J.L. ( Motorola, Inc. (USA) )
Parker, C. ( Motorola, Inc. (USA) )
Patterson, K. ( Motorola, Inc. (France) )
McCauley, R. ( Motorola, Inc. (USA) )
Ercken, M. ( IMEC (Belgium) )
Roey, F.V. ( IMEC (Belgium) )
Vandenbroeck, N. ( IMEC (Belgium) )
Pollentier, I.K. ( IMEC (Belgium) )
さらに 5 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
2
開始ページ:
1131
終了ページ:
1142
総ページ数:
12
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

類似資料:

1 国際会議録 Controlling line-edge rougness to within reasonable limits

Cobb, J.L., Rauf, S., Thean, A., Dakshina-Murthy, S., Stephens, T., Parker, C., Peters, R.D., Rao, V.

SPIE-The International Society for Optical Engineering
7 国際会議録 Characterization of line edge roughness using CD-SAXS [6152-23]

Jones, R.J., Wu, W., Wang, C., Lin, E. K., Choi, K., Rice, B. J., Thompson, G. M., Weigand, S. J., Keane, D. T

SPIE - The International Society of Optical Engineering
2 国際会議録 Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination

Patrick K. Montgomery, Richard Peters, Cesar Garza, Jonathan Cobb, Bill Darlington, Colita Parker, Stan Filipiak, Danny …

SPIE - The International Society of Optical Engineering
8 国際会議録 Integration of UTR processes into MPU IC manufacturing flows

Cobb, J.L., Dakshina-Murthy, S., Parker, C., Luckowski, E., Martinez, A.M., Peters, R.D., Wu, W., Hector, S.D.

SPIE-The International Society for Optical Engineering
3 国際会議録 Front-end-of-line process development using 193-nm lithography

Pollentier,I.K., Ercken,M., Eliat,A., Delvaux,C., Jaenen,P., Ronse,K.

SPIE-The International Society for Optical Engineering
9 国際会議録 Single-layer and bilayer resist processes for EUV-type integrations

Peters, R.D., Parker, C., Cobb, J., Luckowski, E., Weisbrod, E., Dauksher, B.

SPIE - The International Society of Optical Engineering
4 国際会議録 Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

Ercken, M., Leunissen, L.H.A., Pollentier, I., Patsis, G.P., Constantoudis, V., Gogolides, E.

SPIE - The International Society of Optical Engineering
10 国際会議録 Amplitude and spatial frequency characterization of line-edge roughness using CD-SEM

Eytan, G., Dror, O., Ithier, L., Florin, B., Lamouchi, Z., Martin, N.

SPIE-The International Society for Optical Engineering
5 国際会議録 Top coat or no top coat immersion lighography?

Stepanenko, N, Kim, H W, Kishimura, S, Van Den Heuvel, D, Vandenbroeck, N, Kocsis, M, Foubert, P, Maenhoudt, M, Ercken, …

SPIE - The International Society of Optical Engineering
11 国際会議録 Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

C. Wang, R. L. Jones, E. K. Lin, W. Wu, J. S. Villarrubia, K. Choi, J. S. Clarke, B. J. Rice, M. Leeson, J. Roberts, R. …

SPIE - The International Society of Optical Engineering
6 国際会議録 Fabrication of integrated circuits with high yield using ultra-thin resist processes

Peters, R.D., Postnikov, S.V., Cobb, J.L., Dakshina-Murthy, S., Stephens, T., Parker, C., Luckowski, E., Martinez, A.M. …

SPIE-The International Society for Optical Engineering
12 国際会議録 Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12