Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM
- 著者名:
- Kawada, H. ( Hitachi High-Technologies Corp. (Japan) )
- Iizumi, T. ( Hitachi High-Technologies Corp. (Japan) )
- Otaka, T. ( Hitachi High-Technologies Corp. (Japan) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5038
- 発行年:
- 2003
- 巻:
- 2
- 開始ページ:
- 861
- 終了ページ:
- 865
- 総ページ数:
- 5
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- 言語:
- 英語
- 請求記号:
- P63600/5038
- 資料種別:
- 国際会議録
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5
国際会議録
Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography
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