CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

著者名:

Bunday, B.D. ( International SEMATECH (USA) )
Bishop, M. ( International SEMATECH (USA) )
Villarrubia, J.S. ( National Institute of Standards and Technology (USA) )
Vladar, A.E. ( National Institute of Standards and Technology (USA) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5038

発行年:

2003

巻:

1

開始ページ:

674

終了ページ:

688

総ページ数:

15

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448439 [0819448435]

言語:

英語

請求記号:

P63600/5038

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013025
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2003 : 17th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.24-2003.02.27
論文注記:	Line-Edge Roughness and Tool Related Metrology ; 5038-71

類似資料:

1 国際会議録 CD-SEM measurement line edge roughness test patterns for 193 nm lithography Bunday, B.D., Bishop, M., Villarrubia, J.S., Vladar, A.E. SPIE-The International Society for Optical Engineering	7 国際会議録 Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond Bunday, B.D., Bishop, M. SPIE-The International Society for Optical Engineering
2 国際会議録 Determination of optimal parameters for CD-SEM measurement of line-edge roughness Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, … SPIE - The International Society of Optical Engineering	8 国際会議録 Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results C. Wang, R. L. Jones, E. K. Lin, W. Wu, J. S. Villarrubia, K. Choi, J. S. Clarke, B. J. Rice, M. Leeson, J. Roberts, R. … SPIE - The International Society of Optical Engineering
3 国際会議録 Dimensional metrology of resist lines using a SEM model-based library approach Villarrubia, J.S., Vladar, A.E., Bunday, B.D., Bishop, M. SPIE - The International Society of Optical Engineering	9 国際会議録 Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control Bunday, B.D., Bishop, M., Bennett, M.H., Swyers, J.R., Haberman-Golan, Z. SPIE-The International Society for Optical Engineering
4 国際会議録 Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node Bunday, B.D., Bishop, M. SPIE-The International Society for Optical Engineering	10 国際会議録 Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control and several different CMOS features Bunday, B.D., Bishop, M., Swyers, J.R., Lensing, K.R. SPIE-The International Society for Optical Engineering
5 国際会議録 Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node Bunday, B.D., Bishop, M., Allgair, J.A. SPIE - The International Society of Optical Engineering	11 国際会議録 New way of handling dimensional measurement results for integrated circuit technology Vladar, A.E., Villarrubia, J.S., Postek, M.T. SPIE-The International Society for Optical Engineering
6 国際会議録 Simulation study of repeatability and bias in the CD-SEM (Invited Paper) Villarrubia, J.S., Vladar, A.E., Postek, M.T. SPIE-The International Society for Optical Engineering	12 国際会議録 Rinse additives for line-edge roughness control in 193-nm lithography Goldfarb, D.L., Burns, S.D., Burns, R.L., Brodsky, C.J., Lawson, M.C., Angelopoulos, M. SPIE - The International Society of Optical Engineering

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