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CD control at low K1 optical lithography in DRAM device

著者名:
Hong, J. ( Hynix Semiconductor Inc. (South Korea) )
Woo, C. ( Hynix Semiconductor Inc. (South Korea) )
Park, J. ( Hynix Semiconductor Inc. (South Korea) )
Cho, B. ( Hynix Semiconductor Inc. (South Korea) )
Choi, J.-S. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Park, C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, Y.-C. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y. ( Hynix Semiconductor Inc. (South Korea) )
Jeong, G. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
Kang, K. ( Hynix Semiconductor Inc. (South Korea) )
Kang, C. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Song, Y. ( Hynix Semiconductor Inc. (South Korea) )
さらに 10 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
1
開始ページ:
406
終了ページ:
414
総ページ数:
9
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

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