Blank Cover Image

Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.

著者名:
Jones, R.L. ( National Institute of Standards and Technology (USA) )
Hu, T. ( National Institute of Standards and Technology (USA) )
Lin, E.K. ( National Institute of Standards and Technology (USA) )
Wu, W. ( National Institute of Standards and Technology (USA) )
Casa, D.M. ( Argon National Lab. (USA) )
Orji, N.G. ( National Institute of Standards and Technology (USA) )
Vorburger, T.V. ( National Institute of Standards and Technology (USA) )
Bolton, P.J. ( Shipley Co. LLC (USA) )
Barclay, G.G. ( Shipley Co. LLC (USA) )
さらに 4 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
1
開始ページ:
191
終了ページ:
199
総ページ数:
9
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

類似資料:

1 国際会議録 Structural characterizaton of deep-submicron lithographic structures using small-angle nentron scattering

Lin, E.K., Jones, R.L., Wu, W.-L., Barker, J.G., Bolton, P.J., Barclay, G.G.

SPIE-The International Society for Optical Engineering
7 国際会議録 Negative tone 193-nm photoresists

Pugliano, N., Bolton, P.J., Barbieri, T., King, M., Reilly, M.T., Lawrence, W., Kang, D., Barclay, G.G.

SPIE-The International Society for Optical Engineering
2 国際会議録 Preliminary evaluation of line-edge roughness metrology based on CD-SAXS

Jones, R.L., Hu, T., Soles, C.L., Lin, E.K., Wu, W.-, Casa, D.M., Mahorowala, A.

SPIE - The International Society of Optical Engineering
8 国際会議録 Mechanistic understanding of post-etch roughness in 193-nm photoresists

Bae, Y.C., Barclay, G.G., Bolton, P.J., Kavanagh, R.J., Bu, L., Kobayashi, T., Adams, T., Pugliano, N., Thackeray, J.W.

SPIE-The International Society for Optical Engineering
3 国際会議録 Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, …

SPIE - The International Society of Optical Engineering
9 国際会議録 Toward traceability for at-line AFM dimensional metrology

Dixson, R.G., Guerry, A., Bennett, M.H., Vorburger, T.V., Postek, M.T., Jr.

SPIE-The International Society for Optical Engineering
4 国際会議録 Accurate dimensional metrology with atomic force microscopy

Dixson,R.G., Koning,R., Fu,J., Vorburger,T.V., Renegar,B.T.

SPIE - The International Society for Optical Engineering
10 国際会議録 A Three-Phase Model For The Structure Of Porous Thin Films Determined By X-ray Reflectivity And Small-Angle Neutron Scattering

Wu, W., Lin, E.K., Jin, C., Wetzel, J.T.

Materials Research Society
5 国際会議録 Silicon single atom steps as AFM height standards

Dixson,R.G., Orji,N.G., Fu,J., Tsai,V., Williams,E.D., Kacker,R., Vorburger,T.V., Edwards,H.L., Cook,D., West,P.E., …

SPIE-The International Society for Optical Engineering
11 国際会議録 Measurements of water distribution in thin lithographic films

Vogt, B.D., Soles, C.L., Prabhu, V.M., Jones, R.L., Wu, W.-L., Lin, E.K., Goldfarb, D.L., Angelopoulos, M.

SPIE - The International Society of Optical Engineering
6 国際会議録 Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering

Lin,E.K., Wu,W., Lin,Q., Angelopoulos,M.

SPIE-The International Society for Optical Engineering
12 国際会議録 Structure And Property Characterization Of Porous Low-k Dielectric Constant Thin Films Using X-ray Reflectivity And Small Angle Neutron Scattering

Lin, E.K., Wu, W., Jin, C., Wetzel, J.T.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12