Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device
- 著者名:
Smith, B.J. ( Univ. of Texas at Austin (USA) ) Stacey, N.A. ( Univ. of Texas at Austin (USA) ) Donnelly, J.P. ( Univ. of Texas at Austin (USA) ) Onsongo, D.M. ( Univ. of Texas at Austin (USA) ) Bailey, T.C. ( Univ. of Texas at Austin (USA) ) Mackay, C.J. ( Molecular Imprints, Inc. (USA) ) Resnick, D.J. ( Motorola, Inc. (USA) ) Dauksher, W.J. ( Motorola, Inc. (USA) ) Mancini, D.P. ( Motorola, Inc. (USA) ) Nordquist, K.J. ( Motorola, Inc. (USA) ) Sreenivasan, S.V. ( Molecular Imprints, Inc. (USA) ) Banerjee, S.K. ( Univ. of Texas at Austin (USA) ) Ekerdt, J.G. ( Univ. of Texas at Austin (USA) ) Willson, G.C. ( Univ. of Texas at Austin (USA) ) - 掲載資料名:
- Emerging Lithographic Technologies VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5037
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1029
- 終了ページ:
- 1034
- 総ページ数:
- 6
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- 言語:
- 英語
- 請求記号:
- P63600/5037
- 資料種別:
- 国際会議録
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Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography
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Critical dimension and image placement issues for step and flash imprint lithography templates
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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