Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling
- 著者名:
Robertson, S.A. ( Shipley Co. L.L.C. (USA) ) Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) ) O'Connell, D.J. ( Sandia National Labs. (USA) ) McDonald, K. ( Sandia National Labs. (USA) ) Delano, T.M. ( Shipley Co. (USA) ) Goldberg, K.A. ( Lawrence Berkeley National Lab. (USA) ) Hansen, S.G. ( ASML (USA) ) Brown, K.W. ( Shipley Co. L.L.C. (USA) ) Brainard, R.L. ( Shipley Co. L.L.C. (USA) ) - 掲載資料名:
- Emerging Lithographic Technologies VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5037
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 900
- 終了ページ:
- 909
- 総ページ数:
- 10
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- 言語:
- 英語
- 請求記号:
- P63600/5037
- 資料種別:
- 国際会議録
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