Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
- 著者名:
Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Sato, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Bessho, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Okubo, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Yoshioka, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Toyoda, K. ( Tokyo Univ. of Science (Japan) ) - 掲載資料名:
- Emerging Lithographic Technologies VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5037
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 767
- 終了ページ:
- 775
- 総ページ数:
- 9
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- 言語:
- 英語
- 請求記号:
- P63600/5037
- 資料種別:
- 国際会議録
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